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Carbon Nanotubes by Microwave Plasma Enhanced Chemical Vapor Deposition
EP20346
Poster Title: Carbon Nanotubes by Microwave Plasma Enhanced Chemical Vapor Deposition
Submitted on 19 Dec 2013
Author(s): M. Maschmann, A. Goyal, Z. Iqbal, T.S. Fisher, R. Gat
Affiliations: Purdue University
Poster Views: 886
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Poster Information
Abstract: MICROWAVE Plasma generates radical density characteristic of 2000C at much lower effective temperature and can be highly ionized (Low pressure ECR mode) or highly neutral (high pressure mode). Summary: MICROWAVE Plasma generates radical density characteristic of 2000C at much lower effective temperature and can be highly ionized (Low pressure ECR mode) or highly neutral (high pressure mode). Report abuse »
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